Design, Fabrication, Characterization, and Application of Semiconductor Nanocomposites
Yang ng-Fang ng Ch Chen n
Department nt of Ph Physics , Nationa nal Ta Taiwan n Uni niversity, Ta Taipei, Ta Taiwan n
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Design, Fabrication, Characterization, and Application of - - PowerPoint PPT Presentation
Design, Fabrication, Characterization, and Application of Semiconductor Nanocomposites Yang ng-Fang ng Ch Chen n Department nt of Ph Physics , Nationa nal Ta Taiwan n Uni niversity, Ta Taipei, Ta Taiwan n 1 I. A perfect
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0.0 0.1 0.2
0.0 4.0x10
Current (A) Voltage (Volt)
CdSe+SnO2 SnO2
40 80 0.0 1.0x10
2.0x10
3.0x10
¡
10 100 10003 4 5
¡ ¡Enhancement W / m
2Δ i (A)
Time (s)
SnO2 CdSe + SnO2
50 100 150
0.0 1.0x10
2.0x10
3.0x10
Δ i (A)
Time (sec)
CdSe+SnO2
Photoresponse of the two samples with a bias
Cd laser (325nm) with an excitation intensity
illumination power and the photocurrent enhancement.) ¡ Photoresponse of CdSe QDs decorated SnO2 NWs under the illumination of green laser (532nm) with different excitation intensity of 2.5, 6, 9.5, 376 W/m2,
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10 100 10
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K ~ 0.57
Gain
W / m2
325 nm 532 nm Photoresponse gain contributed by CdSe QDs as a function of illumination intensity at excitation wavelength of 325 nm.
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The major part of the energy losses (~52%) is related to the spectral mismatch, known as thermal losses or quantum losses. A large part of high energy photons is lost as heat through phonon scattering, resulting in the limitation of power conversion efficiency of silicon solar cells. Key :Frequency Downconversion Ec
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14 ¡ 0.0 0.2 0.4 0.6 0.8 1.0
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PL Intensity (counts/10
5)
350 400 450 500 550 0.00 0.25 0.50 0.75 1.00 1.25
¡ ¡ ¡
Wavelength (nm) PLE (a.u.)
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p-type Si silicon tips thermal diffusion Ag annealing + RIE n+/p junction back contact spread ZnS QDs metallization metallization finger electrode PSG removing + edge isolation + surface passivation
16 ¡ p-substrate Finger electrode Rear Al electrode n+ emitter
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For the spectral response above 425 nm, since there is no PLE signal from ZnS NPs, frequency down conversion can not entirely account for the enhancement of EQE.
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Figure (a) Scanning electron microscope (SEM) image of fcc close-packed lattice structure of Tb(OH)3/SiO2 core/shell nanospheres (d = 250 nm) (b) Transmittance spectrum of Tb(OH)3/SiO2 photonic crystals, which clearly displays the formation of stop band.
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Figure 2. (a) Scanning electron microscope (SEM) image of SnO2 nanowires on Tb(OH)3/ SiO2 photonic crystals with a metal grid as the mask. (b) Enlarged SEM image of Fig. 2(a). (c) X-Ray diffraction (XRD) pattern of SnO2 nanowires.
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300 400 500 600 700 20000 40000 60000
Tb 250nm/SnO2 Tb 250nm
CL intensity (cps) Wavelength (nm)
65120 7420
Without SnO2 nanowires, the emission intensity is very small.
29 ¡
360 390 420 450 480 510 540 1.2 1.6 2.0 60µJ 83µJ 102µJ
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300 350 400 450 500 550 1.04 1.08 1.12 1.16 1.20 1.24 1.28
80 120 160 200 1.075 1.100 1.125 1.150
Intensity(a.u.) Pumping energy (µJ)
Intensity(a.u.) Wavelength(nm)
73µJ 103µJ 162µJ 200µJ
d)
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polarizer analyzer 660 nm laser 488 nm laser spectrometer microscopy computer
(band filter is included) detector
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¡ ¡
2 2 2 2 2 2
e
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Electrode Electrode Substrate Functional layer
l Emerging resistive switching memory
l Advantages of resistive-type memory:
l Resistive switching memories by 3D cross-bar structure
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I-V characteristics of Ag/SiO2/graphene memory cell. The inset shows the schematics of Ag/SiO2/graphene memory cell.
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I-V characteristics of light-emitting memory (LEM). The inset shows electroluminescence (EL) intensity of LEM as a function of voltage at high resistance state (HRS) and low resistance state (LRS). It has a unique feature of dual functionalities for electrical and optical detections.
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