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State-of-the-art fabrication facility for academic research and industrial R&D
Eckhardt Research Center at the University of Chicago A quantum dot fabricated in the PNF
Anna Mukhortova The University of Chicago VIII RASA Conference - - PowerPoint PPT Presentation
Anna Mukhortova The University of Chicago VIII RASA Conference - - PowerPoint PPT Presentation
Anna Mukhortova The University of Chicago VIII RASA Conference Chicago November 5, 2017 State-of-the-art fabrication facility for academic research and industrial R&D Eckhardt Research Center at the University of Chicago A quantum dot
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3
ISO 5 (class 100) – 100 or fewer particles >5 micron/cubic foot of air
In the gowning room
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4
Bay and chase design 10,000 square feet 1 5 6 2 3 4
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- Deep Si etcher
(Deep Reactive Ion Etching)
- Chlorine ICP
(Inductively coupled plasma) etcher
- Fluorine ICP Etcher
- O2 plasma cleaners
- Sputtering
- Electron-beam
evaporation
- Thermal evaporation
- Atomic layer deposition
- Chemical vapor
deposition (PECVD, HDPCVD, LPCVD)
- High temperature
- xidation
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6
AJA Orion Sputtering System Fluorine ICP Etcher
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2µm wide gold electrodes Deep Si etching – 117µm Etch of 200nm Nb on Si (CF4, CHF3, and Ar)
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- Contact aligner
- Autostepper
- Direct write
lithography
- Electron beam
lithography
- Solvent Benches
- Photoresist Benches
- Developer Benches
Direct Write Lithographer Patterned Si wafer 1.5µm lines and spaces
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10
E-beam Lithographer 7.45 nm lines produced by electron beam lithographer
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- Scanning Electron Microscope
- Atomic Force Microscope
- Stylus Profilometer
- Spectroscopic Ellipsometer
- 4-point measurement system
Scanning Electron Microscope FEI Quanta 650 Horiba Uvisel 2 Ellipsometer
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Gold under 392230x magnification Lithography with the SEM – 20nm lines
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- HF/TMAH Bench
- Acid/Base Bench
- Toxic/Corrosive Bench
- RCA Cleaning Bench
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